Technology

Annealsys Direct Liquid Injection (DLI) reactor technology

Our DLI-CVD / DLI-ALD machines are equipped with direct liquid injection vaporizers for the utilization of the widest range of chemicals including low vapor pressure and thermally unstable precursors. These machines offer multi process capability inside the same process chamber : CVD, ALD, MOCVD, pulse pressure CVD, RTP, RTCVD. This unique feature offer unlimited capabilities for the development of new materials.

The Direct Liquid Injection Technology and Annealsys reactor design offer a number of advantages:
  • Multi process capability: CVD, ALD, pulse pressure CVD, RTP
  • Reactors designed for R&D applications
  • Low cost of ownership, low maintenance requirements
  • Thermalized walls technology, deposition only on substrate
  • Reactor by-pass (interface control)
  • No complicated shower heads
  • Optimized integration of vaporizers
  • Embedded Direct Liquid Injection (DLI) vaporizers
  • State of the art liquid panel for easy precursor management without dead volumes
  • Perfect control of precursor flow (control of the liquid flow)
  • Precursor tanks remains at room temperature
  • Utilization of thermally unstable chemical precursors
  • Utilization of low vapor pressure chemical precursors (solids)
  • Utilization of diluted chemical precursors (safer utilization)
  • Accurate control of doping level
  • Fast vapor switch on/off
  • Coriolis liquid flow meters (no need for calibration)
Advantages of the direct liquid injection vaporizers:
  • Perfect control of precursor flow (control of the liquid flow)
  • Precursor tanks remains at room temperature
  • Utilization of thermally unstable chemical precursors
  • Utilization of low vapor pressure chemical precursors (solids)
  • Utilization of diluted chemical precursors (safer utilization)
  • Accurate control of doping level
  • Fast vapor switch on/off
  • Coriolis liquid flow meters (no need for calibration)