Application guidelines

RTP / RTCVD processes

Rapid thermal process can be divided in three different classes of application: resident reaction, surface interaction, deposition (RTCVD)

Process category	Available systems
Implant annealing Ohmic contact annealing Diffusion of dopants Densification and crystallization	AS-Micro AS-One AS-Premium AS-Master
Implant annealing of silicon carbide	Zenith-100
Oxidation Nitridation Selenization	AS-Micro AS-One AS-Premium AS-Master
Silicon carbonization	AS-Master HT version
RTCVD of graphene	AS-One, AS-Master, Zenith-100
Generation of graphene by sublimation	Zenith-100
RTCVD of graphene RTCVD of hBN (hexagonal boron nitride)	AS-One AS-Master
RTCVD of poly silicon, epitaxial silicon, SiO2, SiNx	AS-Master RTCVD version