The deposition processes are based on Chemical Vapor Deposition (CVD). In CVD, the gases react with the surface of the heated substrate to form a thin layer. The chemical reaction is activated by heat, photons and plasma. Annealsys is specialized in thermal and photon assisted processes. RTCVD process examples are:
RTCVD of graphene (see application note)
RTCVD of hBN (hexagonal boron nitride)
RTCVD of poly silicon, epitaxial silicon, SiO2, SiNx
This group of applications requires more elaborate equipment than the first two. Reaction gases are introduced at controlled rate into an atmospheric or low-pressure environment. Several different gases may have to be supplied and programmed in various ratios to optimize these processes. Additional features are required for silicon based CVD processes.