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Annealsys RTP / RTCVD reactor technology
Annealsys fast PID temperature controller
Annealsys Direct Liquid Injection (DLI) reactor technology
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RTP and RTCVD
AS-Micro
Economical 3-inch Rapid thermal processing system
AS-One
Rapid Thermal Processing furnaces
AS-Premium
Rapid thermal processing system with square chamber
AS-Master
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
High temperature RTP/RTCVD
Zenith-100
Far and Near – Up to one hour at 2000°C
DLI-CVD / DLI-ALD
MC-050
All in one DLI system
MC-100
Easy multi process capabilities reactor for R&D
MC-200
Climb to the 200 mm step
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ALD
Savannah
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ALD Plasma
Fiji
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Home
Applications
DLI processes
Acronyms
Application guidelines
Acronyms
What does DLI mean ?
Vaporization technologies
Processes
Substrates
Support
Contact-us
DLI: Direct Liquid Injection
CVD:
chemical vapor deposition
ALD: Atomic Layer Deposition
MOCVD: Metal Organic
chemical vapor deposition
