Annealsys designs and manufactures process systems for Rapid Thermal Processing / Annealing (RTP / RTA) and Chemical Vapor Deposition (DLI-CVD, DLI-ALD, MOCVD, RTCVD, Spray CVD and LPCVD) for research laboratories and companies for semiconductor, MEMS, nanotechnologies and photovoltaic applications.
 
Annealsys represents companies in French speaking areas of Europe to offer additional process solutions:
Ultratech / Cambrige NanoTech for Atomic Layer Deposition Solutions (ALD)
FHR Anlagenbau for sputtering (PVD), etching, PECVD processes and UV-Ozone cleaning

Annealsys provides high reliability and high quality tools and offers worldwide support and service excellence.

Rapid Thermal Processing and Rapid Thermal Chemical Vapor Deposition
Applications
Implantation annealing
Contact annealing
Crystallization & densification
Rapid thermal oxidation (RTO)
Rapid thermal nitridation (RTN)
Rapid Thermal Processing and Rapid Thermal Chemical Vapor Deposition
Chemical Vapour Deposition and Atomic Layer Deposition
Applications
Simple & multi-metallic oxides
Metals, nitrides and alloys
III-V, wide band gap semiconductors
Nanotubes and nanowires
Chemical Vapour Deposition and Atomic Layer Deposition
Spray-CVD
Applications
2-inch SprayCVD furnace for laboratories.
Aerosol CVD processes
Deposition and annealing in the same chamber.
Spray-CVD
Low Pressure Chemical Vapor Deposition
Applications
Silicon nitride
Poly silicon
Silicon dioxide
Oxidation
Etc.
Low Pressure Chemical Vapor Deposition
Atomic Layer Deposition
Applications
Thermal ALD
Plasma ALD
Oxides
Metals
Etc.
Atomic Layer Deposition
PVD processes
Applications
Sputtering
Etching
Evaporation
UV-Ozone cleaning
Flash annealing
PVD processes