Annealsys manufactures high quality process systems for Rapid Thermal Processing / Annealing (RTP / RTA) and Chemical Vapor Deposition (RTCVD, MOCVD systems, Spray CVD and LPCVD furnaces).
 
Annealsys represents companies in French speaking areas of Europe to offer additional process solutions:
Ultratech for Atomic Layer Deposition Solutions (ALD)
FHR Anlagenbau for sputtering (PVD), etching, PECVD processes and UV-Ozone cleaning
 
Our philosophy involves building-up a long term relationship with our customers, provide high reliability and high quality tools offer worldwide support and service excellence.

Rapid Thermal Processing and Rapid Thermal Chemical Vapor Deposition
Applications
Implantation annealing
Contact annealing
Crystallization & densification
Rapid thermal oxidation (RTO)
Rapid thermal nitridation (RTN)
Rapid Thermal Processing and Rapid Thermal Chemical Vapor Deposition
Spray Chemical Vapour Deposition and Metalorganic Chemical Vapor Deposition
Applications
Metals and alloys
Oxides
Transition metal nitrides
Carbon nanotubes
Nanowires, etc...
Spray Chemical Vapour Deposition and Metalorganic Chemical Vapor Deposition
Low Pressure Chemical Vapor Deposition
Applications
Silicon nitride
Poly silicon
Silicon dioxide
Oxidation
Etc.
Low Pressure Chemical Vapor Deposition
Atomic Layer Deposition
Applications
Thermal ALD
Plasma ALD
Oxides
Metals
Etc.
Atomic Layer Deposition
PVD processes
Applications
Sputtering
Etching
Evaporation
UV-Ozone cleaning
Flash annealing
PVD processes