Annealsys, IN SEARCH OF EXCELLENCE

Annealsys RTP and RTCVD versatile systems

Annealsys Rapid Thermal Processing (RTP) furnaces can address various applications with an extended temperature range and vacuum capability.

The infrared lamp furnaces can perform annealing up to 1450C and for duration up to 1 hour at 1200C. The high temperature Zenith system can run process at 2000C for 1 hour.

Applications include Rapid Thermal Annealing (RTA) processes like ohmic contact annealing and implantation annealing as well as Rapid Thermal Chemical Vapor Deposition (RTCVD) of graphene or hexagonal Boron Nitride (h-BN).

These versatile RTP systems can process samples from few mm up to 200 mm diameter with manual loading or cassette to cassette robot handling for production, including customized solutions for processing compound semiconductor wafers with susceptors.

Economical 3-inch Rapid thermal processing systemAS-Micro

Economical 3-inch Rapid thermal processing system

Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.

The most powerful 3-inch rapid thermal processor for universities

The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications.... Read more about AS-Micro


Rapid Thermal Processing furnaces for the development of rapid thermal annealing and CVD processesAS-One

Rapid Thermal Processing furnaces for the development of rapid thermal annealing and CVD processes

Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.

The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.

The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100... Read more about AS-One


Rapid thermal processing system with square chamberAS-Premium

Rapid thermal processing system with square chamber

The AS-Premium is a multiconfiguration RTP platform that can process silicon and compound semiconductor wafers up 150 mm diameter or square. The system can be used for R&D applications with manual loading and for production applications with cassette to cassette atmospheric robot loading or a vacuum cluster tool.

The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.

The Annealsys AS-Premium system can... Read more about AS-Premium


Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.AS-Master

Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.

Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450C down to 10-6 Torr. Extended RTCVD capabilities (option).

Perfect RTP system for production applications

The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used... Read more about AS-Master


Far and Near  Up to one hour at 2000CZenith-150

Far and Near Up to one hour at 2000C

High Temperature RTP-CVD furnace up to 2000C up to one hour.

The Zenith is high temperature RTP system that can run a one hour process at 2000C

The Zenith-150 system can process samples up to 6-inch diameter at temperature up to 2000C. It is specially... Read more about Zenith-150