Home
Applications
DLI processes
Application guidelines
Acronyms
What does DLI mean ?
Vaporization technologies
What are the advantages and drawbacks of the different vaporization technologies ?
Processes
Substrates
Support
RTP / RTCVD processes
Application guidelines
Acronyms
RTP processes
RTCVD processes
Substrates
R&D to production
Support
Technology
Annealsys RTP / RTCVD reactor technology
Annealsys fast PID temperature controller
Annealsys Direct Liquid Injection (DLI) reactor technology
Products
Annealsys products
RTP and RTCVD
AS-Micro
Economical 3-inch Rapid thermal processing system
AS-One
Rapid Thermal Processing furnaces
AS-Premium
Rapid thermal processing system with square chamber
AS-Master
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
High temperature RTP/RTCVD
Zenith-100
Far and Near – Up to one hour at 2000°C
DLI-CVD / DLI-ALD
MC-050
All in one DLI system
MC-100
Easy multi process capabilities reactor for R&D
MC-200
Climb to the 200 mm step
Veeco-ALD products
ALD
Savannah
Phoenix
ALD Plasma
Fiji
Company
Corporate
Team
News
News
2019
2018
2017
2016
2015
2014
2013
2012
2011
2010
2009
2008
Events
2019
2018
2017
2016
2015
Support
Contact-us
Distributors
Contact Annealsys
Home
News
News
2015
News in 2015
2019
2018
2017
2016
2015
2014
2013
2012
2011
2010
2009
2008
Dec. 14, 2015 - Annealsys appoints Hightec Systems Corporation as distributor in Japan
May. 13, 2015 - Annealsys Workshop from RTP to RTCVD and CVD to ALD
Apr. 10, 2015 - First French ALD Workshop RAFALD
Mar. 09, 2015 - Annealsys process and equipment solutions for graphene and boron nitride
