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RTP / RTCVD processes
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RTP processes
RTCVD processes
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Annealsys RTP / RTCVD reactor technology
Annealsys fast PID temperature controller
Annealsys Direct Liquid Injection (DLI) reactor technology
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Annealsys products
RTP and RTCVD
AS-Micro
Economical 3-inch Rapid thermal processing system
AS-One
Rapid Thermal Processing furnaces
AS-Premium
Rapid thermal processing system with square chamber
AS-Master
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
High temperature RTP/RTCVD
Zenith-100
Far and Near – Up to one hour at 2000°C
DLI-CVD / DLI-ALD
MC-050
All in one DLI system
MC-100
Easy multi process capabilities reactor for R&D
MC-200
Climb to the 200 mm step
Veeco-ALD products
ALD
Savannah
Phoenix
ALD Plasma
Fiji
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2008
Mar. 01, 2008 - Annealsys partner of Crisilal, ANR funded program, for crystallization of silicon thin films on metal substrates for photovoltaic applications
