Annealsys, IN SEARCH OF EXCELLENCE

ALD systems for research and industry worldwide

Atomic Layer Deposition (ALD) has several advantages compared to other techniques due to the current mechanism used to deposit thin film coatings. ALD is specially effective in coating ultra high aspect ratio substrates.
S a vannah the preferred system for university researchers worldwide involved in ALDSavannah the preferred system for university researchers worldwide involved in ALD

A platform of choice for those doing ALD research and development.


P h oenixPhoenix

The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.