Ultratech products


Atomic Layer Deposition (ALD) has several advantages compared to other techniques due to the current mechanism used to deposit thin film coatings. ALD is specially effective in coating ultra high aspect ratio substrates.

A platform of choice for those doing ALD research and development.


The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.

ALD Plasma

Ultratech has designed the Fiji Plasma (ICP) source to provide excellent film uniformity with minimal substrate damage. In association with the thermal ALD mode and the Exposure™ mode the Fiji is the perfect tool to address the widest range of ALD processes.

Fiji F200 series is the Cambridge NanoTech most advanced ALD research and development system.