The AS-One systems are available with two sizes of reactors to process substrates up to 100 mm (4”) or 150 mm (6”) diameter. The machine has been specially developed to meet the requirements of research laboratories and small-scale production up to 10,000 wafers per year. The high reliability guarantees low cost of ownership. The floor standing configuration and the reduced footprint allow easy installation in cleanroom.
The AS-One system has a stainless steel cold wall process chamber for better process reproducibility and higher cooling rates. The special design of the process chamber provides a low volume for fast pumping and purging and low consumption of process gases.
Pyrometer and thermocouple temperature measurements are standard features. The fast digital PID controller provides accurate and repeatable thermal control across the temperature range.
The clam shell style design of the process chamber gives full access to the bedplate and provides easy access for loading and unloading the substrates and allows practical cleaning of the chamber.