Annealsys Rapid Thermal Processing (RTP) furnaces can address various applications with an extended temperature range and vacuum capability.
The infrared lamp furnaces can perform annealing up to 1450°C and for duration up to 1 hour at 1200°C. The high temperature Zenith system can run process at 2000°C for 1 hour.
Applications include Rapid Thermal Annealing (RTA) processes like ohmic contact annealing and implantation annealing as well as Rapid Thermal Chemical Vapor Deposition (RTCVD) of graphene or hexagonal Boron Nitride (h-BN).
These versatile RTP systems can process samples from few mm² up to 200 mm diameter with manual loading or cassette to cassette robot handling for production, including customized solutions for processing compound semiconductor wafers with susceptors.
Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
The most powerful 3-inch rapid thermal processor for universities
The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications.
Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.
The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.
The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100
RTP system with square chamber for substrates up to 156 mm x156 mm. Multiple system configurations.
The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.
The Annealsys AS-Premium system can process
Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).
The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used for process development.