The Annealsys MC-050 system is a 2-inch DLI-CVD / DLI-ALD reactor developed to meet the requirements of research and development units.
The infrared lamp furnace in association with the direct liquid injection vaporizers provide unique multi process capabilities inside the same process chamber: CVD, ALD, MOCVD, RTP and RTCVD.
The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allow utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provide perfect interface control for deposition of nanolaminates.
The MC-050 is the perfect machine for the development of new materials and nanolaminates using the widest range of solid and liquid organometallic precursors.