DLI-CVD / DLI-ALD

Annealsys offers innovative direct liquid injection deposition systems that can be used to perform deposition in ALD and CVD mode inside the same chamber and using the widest range of liquid and solid chemical precursors.
More about DLI processes
MC- 050MC-050

Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.

The Annealsys MC-050 system is a 2-inch DLI-CVD / DLI-ALD reactor developed to meet the requirements of research and development units.

The infrared lamp furnace in association... Read more about MC-050


MC- 100MC-100

100 mm (4-inch) DLI-ALD / DLI-ALD Reactor for R&D.

The Annealsys MC-100 system is a 100 mm DLI-CVD / DLI-ALD reactor developed for research and development applications.

The process chamber enables to perform CVD and ALD... Read more about MC-100


MC- 200MC-200

The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.

The Annealsys MC-200 is a 200 mm thermally controlled wall CVD reactor specially developed to meet the requirements of research and development units for MOCVD processes.

The... Read more about MC-200