DLI-CVD / DLI-ALD innovative vaporization technologies

Annealsys offers innovative direct liquid injection deposition systems that can be used to perform deposition in ALD and CVD mode inside the same chamber and using the widest range of liquid and solid chemical precursors.
What are the advantages and drawbacks of the different vaporization technologies ?
All in one DLI systemMC-050

All in one DLI system

Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.

Direct liquid injection vaporizers with lamps heating make the MC-050 a unique machine with multi process capabilities like a cluster tool but inside a single process chamber.

The Annealsys MC-050... Read more about MC-050

Easy multi process capabilities reactor for R&DMC-100

Easy multi process capabilities reactor for R&D

100 mm (4-inch) DLI-CVD / DLI-ALD Reactor for R&D.

The MC-100 with the rotating substrate heater and possibility to adjust the height of the substrate inside the reactor provides enhanced thin film uniformity.

The Annealsys MC-100 system is a 100... Read more about MC-100

Climb to the 200 mm stepMC-200

Climb to the 200 mm step

The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.

For air sensitive applications the MC-200 can receive a motorized single wafer loadlock to isolate the process chamber from atmosphere.

The Annealsys MC-200 is a 200 mm thermally controlled wall... Read more about MC-200