Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.
Direct liquid injection vaporizers with lamps heating make the MC-050 a unique machine with multi process capabilities like a cluster tool but inside a single process chamber.
The Annealsys MC-050
100 mm (4-inch) DLI-CVD / DLI-ALD Reactor for R&D.
The MC-100 with the rotating substrate heater and possibility to adjust the height of the substrate inside the reactor provides enhanced thin film uniformity.
The Annealsys MC-100 system is a 100
The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.
For air sensitive applications the MC-200 can receive a motorized single wafer loadlock to isolate the process chamber from atmosphere.
The Annealsys MC-200 is a 200 mm thermally controlled wall