Annealsys products

RTP and RTCVD

Our Rapid Thermal Processing (RTP) and Rapid Thermal CVD (RTCVD) systems can process samples from few mm² up to 200 mm diameter.
These versatile machines can performed a wide range of processes from contact annealing to chemical vapor deposition of graphene or h-BN.

See the three different classes of application of Rapid thermal process
Economical 3-inch Rapid thermal processing systemAS-Micro

Economical 3-inch Rapid thermal processing system

Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.

The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications. It can process substrates from few square millimeters up to... Read more about AS-Micro


Rapid Thermal Processing furnacesAS-One

Rapid Thermal Processing furnaces

Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.

The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100 mm (4”) or 150 mm (6”) diameter. The machine has been specially developed to meet the... Read more about AS-One


Rapid thermal processing system with square chamberAS-Premium

Rapid thermal processing system with square chamber

RTP system with square chamber for substrates up to 156 mm x156 mm. Multiple system configurations.

The Annealsys AS-Premium system can process samples up to 156x156 mm² samples.

The reactor platform and the machine have been designed to accommodate a wide range of ... Read more about AS-Premium


Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.AS-Master

Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.

Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).

The Annealsys AS-Master Rapid Thermal Processor is a highly versatile tool allowing a wide range of processes from annealing to Rapid Thermal Chemical Vapor Deposition.

... Read more about AS-Master


High temperature RTP/RTCVD

Annealsys has developed a high temperature RTP/RTCVD furnace to meet the needs of graphene generation by sublimation of silicon from silicon carbide and the implantation annealing of silicon carbide wafers.
More about RTP / RTCVD processes
Zenith- 100Zenith-100

High Temperature RTP-CVD furnace up to 2000°C up to one hour.

The Zenith-100 system can process samples up to 4-inch diameter at temperature up to 2000°C. It is specially developed to meet the requirements of universities research laboratories.

... Read more about Zenith-100


DLI-CVD / DLI-ALD

Annealsys offers innovative direct liquid injection deposition systems that can be used to perform deposition in ALD and CVD mode inside the same chamber and using the widest range of liquid and solid chemical precursors.
More about DLI processes
MC- 050MC-050

Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.

The Annealsys MC-050 system is a 2-inch DLI-CVD / DLI-ALD reactor developed to meet the requirements of research and development units.

The infrared lamp furnace in association... Read more about MC-050


MC- 100MC-100

100 mm (4-inch) DLI-ALD / DLI-ALD Reactor for R&D.

The Annealsys MC-100 system is a 100 mm DLI-CVD / DLI-ALD reactor developed for research and development applications.

The process chamber enables to perform CVD and ALD... Read more about MC-100


MC- 200MC-200

The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.

The Annealsys MC-200 is a 200 mm thermally controlled wall CVD reactor specially developed to meet the requirements of research and development units for MOCVD processes.

The... Read more about MC-200