RTP and RTCVD
Economical 3-inch Rapid thermal processing system
Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
The most powerful 3-inch rapid thermal processor for universities
The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications.
Rapid Thermal Processing furnaces
Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.
The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.
The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100
Rapid thermal processing system with square chamber
RTP system with square chamber for substrates up to 156 mm x156 mm. Multiple system configurations.
The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.
The Annealsys AS-Premium system can process
Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.
Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).
The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used for process development.
High temperature RTP/RTCVD
Far and Near – Up to one hour at 2000°C
High Temperature RTP-CVD furnace up to 2000°C up to one hour.
The Zenith is high temperature RTP system that can run a one hour process at 2000°C
The Zenith-100 system can process samples up to 4-inch diameter at temperature up to 2000°C. It is specially
DLI-CVD / DLI-ALD
All in one DLI system
Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.
Direct liquid injection vaporizers with lamps heating make the MC-050 a unique machine with multi process capabilities like a cluster tool but inside a single process chamber.
The Annealsys MC-050
Easy multi process capabilities reactor for R&D
100 mm (4-inch) DLI-CVD / DLI-ALD Reactor for R&D.
The MC-100 with the rotating substrate heater and possibility to adjust the height of the substrate inside the reactor provides enhanced thin film uniformity.
The Annealsys MC-100 system is a 100
Climb to the 200 mm step
The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.
For air sensitive applications the MC-200 can receive a motorized single wafer loadlock to isolate the process chamber from atmosphere.
The Annealsys MC-200 is a 200 mm thermally controlled wall