Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications. It can process substrates from few square millimeters up to
Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.
The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100 mm (4”) or 150 mm (6”) diameter. The machine has been specially developed to meet the
RTP system with square chamber for substrates up to 156 mm x156 mm. Multiple system configurations.
The Annealsys AS-Premium system can process samples up to 156x156 mm² samples.
The reactor platform and the machine have been designed to accommodate a wide range of
Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).
The Annealsys AS-Master Rapid Thermal Processor is a highly versatile tool allowing a wide range of processes from annealing to Rapid Thermal Chemical Vapor Deposition.
Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.
The Annealsys MC-050 system is a 2-inch DLI-CVD / DLI-ALD reactor developed to meet the requirements of research and development units.
The infrared lamp furnace in association
The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.
The Annealsys MC-200 is a 200 mm thermally controlled wall CVD reactor specially developed to meet the requirements of research and development units for MOCVD processes.