Annealsys, IN SEARCH OF EXCELLENCE

Annealsys products

RTP and RTCVD

Economical 3-inch Rapid thermal processing systemAS-Micro

Economical 3-inch Rapid thermal processing system

Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.

The most powerful 3-inch rapid thermal processor for universities

The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications.... Read more about AS-Micro


Rapid Thermal Processing furnacesAS-One

Rapid Thermal Processing furnaces

Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.

The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.

The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100... Read more about AS-One


Rapid thermal processing system with square chamberAS-Premium

Rapid thermal processing system with square chamber

RTP system with square chamber for substrates up to 156 mm x156 mm. Multiple system configurations.

The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.

The Annealsys AS-Premium system can process... Read more about AS-Premium


Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.AS-Master

Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system.

Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).

The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used for process development.

The Annealsys... Read more about AS-Master


High temperature RTP/RTCVD

Far and Near – Up to one hour at 2000°CZenith-100

Far and Near – Up to one hour at 2000°C

High Temperature RTP-CVD furnace up to 2000°C up to one hour.

The Zenith is high temperature RTP system that can run a one hour process at 2000°C

The Zenith-100 system can process samples up to 4-inch diameter at temperature up to 2000°C. It is specially... Read more about Zenith-100


DLI-CVD / DLI-ALD

All in one DLI systemMC-050

All in one DLI system

Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.

Direct liquid injection vaporizers with lamps heating make the MC-050 a unique machine with multi process capabilities like a cluster tool but inside a single process chamber.

The Annealsys MC-050... Read more about MC-050


Easy multi process capabilities reactor for R&DMC-100

Easy multi process capabilities reactor for R&D

100 mm (4-inch) DLI-CVD / DLI-ALD Reactor for R&D.

The MC-100 with the rotating substrate heater and possibility to adjust the height of the substrate inside the reactor provides enhanced thin film uniformity.

The Annealsys MC-100 system is a 100... Read more about MC-100


Climb to the 200 mm stepMC-200

Climb to the 200 mm step

The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.

For air sensitive applications the MC-200 can receive a motorized single wafer loadlock to isolate the process chamber from atmosphere.

The Annealsys MC-200 is a 200 mm thermally controlled wall... Read more about MC-200