May. 02, 2016
Annealsys is pleased to announce a Distributor agreement with Deam for the sales of our Rapid Thermal Processing
) and Direct Liquid Injection CVD and ALD deposition systems in Italy.
Annealsys Rapid Thermal Processing
systems have been designed to offer a wide range of process capabilities from annealing (RTA) to Chemical Vapor Deposition (RTCVD). The cold wall chamber technology and reactor designs offer a number of advantages: high process reproducibility, low memory effect, high cooling rates, low temperature pyrometer control, ultra clean environment, atmospheric and standard vacuum capability.
Annealsys DLI-CVD / DLI-ALD machines are equipped with direct liquid injection vaporizers for the utilization of the widest range of chemicals including low vapor pressure and thermally unstable precursors. These machines offer multi process capability inside the same process chamber: CVD, ALD, MOCVD, pulse pressure CVD including RTP
and RTCVD for the MC050. These unique features offer unlimited capabilities for the development of new materials. The association of Annealsys experience and leading market position in RTP
and DLI systems with Deam knowledge of the Italian market is providing high performance and high quality systems and customer support for process development and manufacturing to Italian laboratories and companies.