Jul. 23, 2014
Montpellier, France, July 23, 2014
ANNEALSYS, equipment manufacturer specialized in Rapid Thermal Processing
) and chemical vapor deposition (CVD and ALD) systems has signed a distribution agreement with RIBER, worldwide leader of molecular beam epitaxy (MBE) systems.
Riber designs and manufactures molecular beam epitaxy (MBE) systems as well as high-quality material evaporation sources and cells for the semi-conductor industry. These high technology systems are required for the manufacturing of compound semiconductors and new materials used for a wide range of applications including organic LED TVs, information technologies and new generation of solar cells.
The partnership will focus on CVD and ALD products as well as American and Asian regions.
Annealsys is looking to accelerate its sales of thin film deposition machines equipped with direct liquid injection (DLI) vaporizers. These deposition systems allows working in several process modes (CVD, ALD, pulse pressure CVD and even RTP
) inside the same reactor. These machines are extremely versatile and offer unique process capabilities for the development of new materials for semiconductor and nanotechnology applications.
The agreement is an opportunity for ANNEALSYS to develop international sales and service network with the commercial know-how and the notoriety of RIBER in research laboratories. About AnnealsysAnnealsys, founded in 2004, designs, manufactures and sells rapid thermal processing (RTP) furnaces and thin film deposition machines using CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) processes. These machines allow the deposition of new materials for a wide range of applications: semiconductor, microsystems, optoelectronics, solar cells, glass, ceramics, and superconductors.
Annealsys machines are primarily used in research laboratories and universities, and for industrial companies producing small batches.
Annealsys has the Innovative Company Label from BPI France
Contact: Franck Laporte
Web site: www.annealsys.com