News in 2009

Annealsys presents its new catalog of CVD, MOCVD and Spray CVD systems

Aug. 01, 2009

These reactors were specially developed for R&D applications. They allow doing heteroepitaxy of oxides, metals and transition metal nitrides and other materials on a wide range of substrates by MOCVD and Spray CVD using solid and liquid organometallic volatile precursors.