News in 2009

Annealsys presents its new catalog of CVD, MOCVD and Spray CVD systems

Aug. 01, 2009


These reactors were specially developed for R&D applications. They allow doing heteroepitaxy of oxides, metals and transition metal nitrides and other materials on a wide range of substrates by MOCVD and Spray CVD using solid and liquid organometallic volatile precursors.

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