Partners

Annealsys is developping a network of partners for the design and qualification of Rapid Thermal Processing and Chemical Vapor Deposition systems. The company is also involved in collaborative research projects as key partner with high expertise in Rapid Thermal Annealing and deposition processes.

ELOGE

Description: Optimized electrolyte for 3D architecture (batteries)
Period: 2009-2011
Partners: Agence nationale de la recherche (ANR), CEA-DRT-LITEN, LMGP, Laboratoire Laplace, ST Microelectronics, Biophy Research

MC100

Description: Development of innovative 4-inch MOCVD reactor

Period: 2006-2009

Partner: OSEO - Région Languedoc Roussillon

CRISILAL

Description: Silicon recristallisation for PV applications
Period: 2008-2009
Partners: Agence nationale de la recherche (ANR), CEA-DRT-LITEN, ULP-InESS, Imphy Alloys, Photowatt

MC050

Description: Development of 2-inch MOCVD furnace with in-situ annealing capability
Period: 2008-2009
Partner: Transferts LR

AS-Master

Description: Development of a high temperature 200 mm Rapid Thermal Processing system up to 1500°C
Period: 2005-2006
Partner: OSEO - Région Languedoc Roussillon

LC100

Description: 4-inch tubular furnace for annealing and LPCVD processes
Period: 2005-2006
Partner: Région Languedoc Roussillon

AS-One

Description: Modelling of RTP reactor
Period: 2004-2006
Partner: ENSAM Angers

AS-Micro

Description: Development of 3-inch RTP system for laboratories

Period: 2004
Partner: Transferts LR, Région Languedoc Roussillon