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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA) and sputtering and plasma equiment from FHR (Germany)
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AS-Micro, AS-One, AS-Master
Applications
Implantation annealing
Contact annealing
Crystallization & densification
Rapid thermal oxidation (RTO)
Rapid thermal nitridation (RTN)
Diffusion, selenization

Rapid Thermal Processing and Rapid Thermal Chemical Vapor Deposition
SprayCVD-050, MC050, MC100
Applications
Metals and alloys
Oxides
Transition metal nitrides
Carbon nanotubes
Nanowires
Others...
Spray Chemical Vapour Deposition and Metalorganic Chemical Vapor Deposition
LC100
Applications
Silicon nitride
Poly silicon
Doped poly silicon
Silicon dioxide
Oxidation
Etc.
Low Pressure Chemical Vapor Deposition
FHR Anlagenbau GmbH has long years of experience in physical vapour deposition based upon DC, RF magnetron Sputtering and most advanced reactive bipolar & unipolar technologies as well as for evaporation according to the state of the art.
Sputtering systems
Applications
DC and RF Sputtering
Reactive Sputtering
Thermal evaporation
Electron beam evaporation
PVD processes
Etching systems
Applications
Silicon and silicon compounds
Compound semiconductors
Metals, resist removal
Pre-treatment applications
Dry or plasma etching
Table top systems
Applications
Final cleaning before coating or prior to wire-bonding processes
Photo resist stripping, baking, descumming and hardening
Cleaning and surface activation