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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
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FHR Products

Versatile systems for thin film deposition processes for production and R&D for PVD (Physical Vapor Deposition) processes by DC and RFsputtering with pretreatment facilities by heating and sputter etching. PECVD systems, plasma etching systems and UV-Ozone cleaning systems are also available.
Sputtering (PVD processes)
Versatile system for thin film deposition processes in small scale production and R&D for PVD.
Description
Versatile system for thin film deposition processes in small scale production and R&D for PVD.
Versatile system for thin film deposition processes in small scale production and R&D for PVD.
Etching (Dry or plasma etching)
Wide range of laboratory systems for dry and plasma etching processes.
Description
Wide range of laboratory systems for dry and plasma etching processes.
Wide range of laboratory systems for dry and plasma etching processes.
UV-Ozone cleaning (Cleaning and surface activation )
Designed for UV-Ozone cleaning and surface activation processes.
Description
Designed for UV-Ozone cleaning and surface activation processes.
Designed for UV-Ozone cleaning and surface activation processes.