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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)

Low cost 2-inch MOCVD system for R&D laboratory.
Deposition and annealing in the same chamber.

Applications
  • Metal and alloys, oxides, nitrides, III-V, II-VI,...
  • Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
  • Nitrides and alloys: GaN, AlN, GaAs, GaAsN...
  • High k Dielectrics: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
  • Ferroelectrics: SBT, SBTN, PLZT, PZT,…
  • Superconductors: YBCO, Bi-2223, Bi-2212, Tl-1223, …
  • Piezoelectrics: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
  • Metals: Pt, Cu,...
  • Colossal Magneto Resistance
  • Thermal coatings, Buffer layers, Mechanical coatings, Optics
  • Etc...
Specifications
  • The Annealsys MC050 is a 2-inch MOCVD system especially developed to meet the requirements of research and development units.
  • The MC050 allows doing deposition of oxides, nitrides, metals, III-V and II-VI on various types of substrates by MOCVD using diluted solid and liquid organometallic precursors..
  • The MC050 system can be provided with direct injection vaporizers allowing the widest range of utilization of precursors for development of new materials. The infrared lamp heating system provides in-situ annealing process capability in the deposition chamber.
Performance & characteristics
  • Temperature range: RT to 1200°C
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-3 Torr
  • Glove box loading option
  • High vacuum capability in option