- RTP Systems
- High temperature RTP furnace
Zenith Series
High temperature RTP furnace
Concernant ce produit
Applications
High Temperature RTP furnace up to 2000°C for one hour
Specifications
Specifications of the Zenith : high temperature RTP system
The Zenith systems are vailable in two sizes: Zenith 100 to process wafers up to 100 mm diamter and the Zenith 200 to process samples up to 200 mm diameter at temperature up to 2000°C. Thay have been specially developed to meet the requirements of universities research laboratories.
The system has a stainless steel water-cooled chamber. The cold wall chamber technology provides significant advantages: high process reproducibility, low memory effect, higher cooling rates.
The high temperature tungsten heaters provide enhanced temperature uniformity. The system is not compatible with oxidizing atmosphere and the installation of a turbo pump is mandatory.
Both pyrometer and thermocouple temperature measurement are standard features. The fast digital PID temperature controller provides high and stable temperature repeatability (± 1°C). The system assures accurate and repeatable thermal control across the temperature range.
The design process chamber provides easy loading and unloading of the substrates and the installation of the thermocouples.
Characteristics
The fastest ramp rate for high temperature annealing
The Zenith has the fastest ramp rate for high temperature annealing with 1°C/s up to 1800°C
- Up to 2000°C
- Heating rate: room temperature to 2000°C in 35 minutes
- High vacuum
- Vacuum, neutral gas and reducing process atmosphere
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