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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Atomic layer deposition has several advantages over other techniques due to the actual mechanism used to deposit films. ALD is especially advantageous when film quality or thickness is critical. ALD is also quite effective at coating ultra high aspect ratio substrates or substrates that would be difficult to coat with other thin film techniques.
A platform of choice for those doing ALD research and development.
Description
A platform of choice for those doing ALD research and development.
A platform of choice for those doing ALD research and development.
The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.
Description
The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.
The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.
The Tahiti System is engineered for large-area manufacturing operations
Description
The Tahiti System is engineered for large-area manufacturing operations
The Tahiti System is engineered for large-area manufacturing operations