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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)

200mm Versatile RTP system
RTCVD capability (option)
From RT to 1500°C down to 10-6 Torr.

Applications
  • Rapid Thermal Processing (RTA, RTO...)
  • SiC contact annealing, Carbonization
  • Compound semiconductor annealing
  • Implant quality control
  • RTCVD (poly silicon, SiO2, SiNx,…)
  • Etc…
Specifications
  • The AS-Master rapid thermal processor is a highly versatile tool allowing a wide range of processes from annealing to rapid thermal chemical vapor deposition.
  • The high temperature version can run annealing processes up to 1500°C and allows new process development. Optional square chamber is available for large square or rectangular samples processing.
  • The cold wall chamber technology provides high process reproducibility under ultra clean and contamination-free environment.
  • Loadlock and cluster tool module versions are available for improved process environment cleanness.
  • The extended temperature range, the vacuum performance (atmosphere to 10-7 Torr) and gas mixing capability make AS-Master suitable for a large range of RTP and RTCVD processes.
  • Pyrometer and thermocouple temperature measurement associated with fast digital PID temperature controller provide high and stable temperature accuracy.
  • Manual loading and cassette to cassette versions make system suitable for process development and easy transfer to production.
Performance & characteristics
  • Temperature range: RT to 1500°C
  • Ramp rate up to 200°C/s
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-7 Torr