Description
3-inch RTP system for laboratories. Dual chamber version for cross contamination issues
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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Rapid Thermal Processing (or RTP) from 2-inch to 8-inch. Up to 1500°C and 250°C/s
Annealsys Rapid Thermal Annealing furnaces use infrared lamp heating and can be used for various applications for silicon, compound semiconductor, photovoltaic, MEMS and other materials. Typical processes include implantation annealing, contact annealing, crystallization and densification. Rapid thermal oxidation and nitridation are also commonly performed.
Annealsys can provide specific solutions for development of Rapid Thermal Selenization process.
Annealsys Rapid Thermal Annealing furnaces use infrared lamp heating and can be used for various applications for silicon, compound semiconductor, photovoltaic, MEMS and other materials. Typical processes include implantation annealing, contact annealing, crystallization and densification. Rapid thermal oxidation and nitridation are also commonly performed.
Annealsys can provide specific solutions for development of Rapid Thermal Selenization process.
Description
Rapid Thermal Processing cold wall chamber furnaces 4-inch (100 mm) and 6-inch (150 mm) versions
