Annealsys, IN SEARCH OF EXCELLENCE

ALD

Atomic Layer Deposition (ALD) has several advantages compared to other techniques due to the current mechanism used to deposit thin film coatings. ALD is specially effective in coating ultra high aspect ratio substrates.
SavannahSavannah

A platform of choice for those doing ALD research and development.


PhoenixPhoenix

The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.