ALD

Atomic layer deposition (ALD) has several advantages over other techniques due to the actual mechanism used to deposit thin film coatings. ALD is especially effective at coating ultra high aspect ratio substrates.
Savannah (©annealsys.com 2016)Savannah
A platform of choice for those doing ALD research and development.
Phoenix (©annealsys.com 2016)Phoenix
The Phoenix uses proprietary precursor delivery system to deposit films on surfaces.