Annealsys products

RTP and RTCVD

Our RTP/RTCVD systems have the capability to process samples from few mm² up to 200 mm diameter. These versatile machines can performed a wide range of processes from contact annealing to chemical vapor deposition of graphene or h-BN.
More about RTP / RTCVD processes
AS-Micro main (©annealsys.com 2016)AS-Micro
Economical 3-inch RTP system for laboratories and education.Dual chamber version to avoid cross contamination issues.
AS-One (©annealsys.com 2016)AS-One
Versatile Rapid Thermal Processing cold wall chamber furnaces.4-inch (100 mm) and 6-inch (150 mm) versions.
AS-Premium (©annealsys.com 2016)AS-Premium
RTP system with square chamber for substrates up to 156 mm x156 mm.Multiple system configurations.
AS-Master (©annealsys.com 2016)AS-Master
Versatile 200 mm RTP/RTCVD system from Research to Production.From RT to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).

High temperature RTP/RTCVD

Annealsys has developed a high temperature RTP/RTCVD furnace to cover the need of graphene generation by sublimation of silicon from silicon carbide and the implantation annealing of silicon carbide wafers.
More about RTP / RTCVD processes
Zenith-100 (©annealsys.com 2016)Zenith-100
High Temperature RTP-CVD furnace up to 2000°C.

DLI-CVD / DLI-ALD

Annealsys proposes innovative direct liquid injection deposition systems that can be use to perform deposition in ALD and CVD mode inside the same chamber and using the widest range of liquid and solid chemical precursors.
More about DLI processes
MC-050 (©annealsys.com 2016)MC-050
Laboratory 2-inch DLI system.Multi-process capability in the same chamber: DLI-CVD, DLI-ALD, MOCVD, RTP, RTCVD.
MC-100 (©annealsys.com 2016)MC-100
100 mm (4-inch) DLI-ALD / DLI-ALD Reactor for R&D.
MC-200 (©annealsys.com 2016)MC-200
The Annealsys MC-200 is a 200 mm DLI-CVD/ALD system for R&D.Capacitance plasma version is available.