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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)

Sputtering system for 150 mm diameter or 100x100 mm2 substrates

Applications
The V4 model is recommended to deposit 4 items (8 possible) sequentially or simultaneously (cosputtering) on substrates of 150 mm diameter or 100x100 mm2 and with many possibilities of options like deposition by pulsed laser, thermal evaporation, rotary furnace, plasma analysis, measurement of thickness with quartz balance or by ellipsometry, loading chamber (load lock) ...
Specifications
• Substrate size: 150 mm diameter or 100x100 mm2
• Up to 8 sputtering sources
• Deposition by pulsed laser (Option)
• Rotary furnace (Option)
• Load lock (Option)
• ...