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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)

System for deposition under high vacuum.
Bell type system with methods of evaporation that can be resistive, e-beam or sputtering.

Applications
The TE12 system is recommended for depositing up to 4 materials in sequential mode (multi-layers) o simultaneously for depositing alloys.
Specifications
• Substrate size: 100 mm diameter or 100x100 mm2
• Up to 4 sources