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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
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Sputtering for laboratories

INTERCOVAMEX is the leading provider for laboratory systems of coating and thin films deposition by the method of sputtering using a plasma of inert or reactive gas.
Economic sputtering for 100 mm diameter substrates or 100x100 mm 2
Description
Economic sputtering for 100 mm diameter substrates or 100x100 mm 2
Economic sputtering for 100 mm diameter substrates or 100x100 mm 2
Multi-technique and multi-geometrical system for PVD and CVD coatings
Description
Multi-technique and multi-geometrical system for PVD and CVD coatings
Multi-technique and multi-geometrical system for PVD and CVD coatings
Sputtering system for 125 mm diameter substrates or 100x100 mm 2 substrates
Description
Sputtering system for 125 mm diameter substrates or 100x100 mm 2 substrates
Sputtering system for 125 mm diameter substrates or 100x100 mm 2 substrates
Sputtering system for 150 mm diameter or 100x100 mm 2 substrates
Description
Sputtering system for 150 mm diameter or 100x100 mm 2 substrates
Sputtering system for 150 mm diameter or 100x100 mm 2 substrates
System for deposition under high vacuum. Bell type system with methods of evaporation that can be resistive, e-beam or sputtering.
Description
System for deposition under high vacuum. Bell type system with methods of evaporation that can be resistive, e-beam or sputtering.
System for deposition under high vacuum. Bell type system with methods of evaporation that can be resistive, e-beam or sputtering.