Description
Economic sputtering for 100 mm diameter substrates or 100x100 mm 2
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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
INTERCOVAMEX is a very-price-competitive provider for laboratory multitechnique systems for coating and thin films deposition by the methods of sputtering , resistive evaporation, e beam evaporation or pulsed laser deposition. These techniques are used in R&D to develop new materials and also in manufacturing plants of DVDs, hard disks, energy efficient windows, semiconductors, optoelectronics, optics, medical devices, photovoltaic cells...
Sputtering for laboratories (PVD processes)
Description
Sputtering system for 125 mm diameter substrates or 100x100 mm 2 substrates
Description
System for deposition under high vacuum. Bell type system with methods of evaporation that can be resistive, e-beam or sputtering.
