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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)

Designed for UV-Ozone cleaning and surface activation processes.

Applications
The table top systems UVOH 150, UVOH 300 and UVOH 150 LAB are especially designed for UV-Ozone cleaning and surface activation processes on different substrates for production and laboratory applications.
Specifications
Substrate size max.: 
  • UVOH 150 : 160 mm x 160 mm x 10 mm
  • UVOH 300 : 300 mm x 300 mm x 10 mm
Irradiation intensity: > 50 mW/cm2
Irradiation time: 1 s ... 99 min 59 sec
Gas: O2 gas line 1/4" VCRŽ with Rotameter 0,1 ... 1,0 slm, max.2,5 bar
Exhaust: 2" diameter (exhaust with 100 cfm required)

Power supply: 
  • UVOH 150 : 220V AC, 50/60 Hz, 1000 W 
  • UVOH 300 : 220V AC, 50/60 Hz, 1500 W
System dimensions: 
  • UVOH 150 : WxHxD 520 mm x 300 mm x 420 mm 
  • UVOH 300 : WxHxD 700 mm x 300 mm x 600 mm ca.
Weight:
  • UVOH 150 : 38 kg 
  • UVOH 300 : 50 kg
Datasheet
  • Datasheet English