Phoenix

The Phoenix is a batch ALD system, engineered for high throughput and maximum uptime in any manufacturing environment, ensuring repeatable, highly accurate film deposition on Gen 2.5 substrates. And with support for up to six individual precursor lines, the Phoenix delivers solid, liquid, or gaseous process chemistries depending on your thin film needs. A compact footprint and innovative design, plus numerous automation options, makes Phoenix the practical choice for those with batch production ALD requirements.

Key features include:

• Precise software control of process parameters including temperature, flow, and pressure delivers defect-free coatings on even the most sensitive substrates
• 4000 hours Mean Time Between Failures (MTBF) for maximum uptime
• Patented ALD Shield™ vapor trap prevents build-up of deposits and prohibits excess gases from being exhausted to the environment
• Large process chamber coats up to five GEN 2.5 substrates, multiple wafer cassettes, and larger 3D objects
• Low cost of ownership with minimal startup and operational costs, and a compact footprint (656 x 676 mm) that conserves valuable clean room space
• Standard recipes and ALD materials are readily available
• Comprehensive support and services worldwide from our ALD expert team
• The Phoenix System is CE, FCC, and CSA compliant and has many built-in safety features