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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)

Atomic Layer Deposition has several advantages over other techniques due to the actual mechanism used to deposit films. ALD is especially advantageous when film quality or thickness is critical. ALD is also quite effective at coating ultra high aspect ratio substrates or substrates that would be difficult to coat with other thin film techniques.