RTP / RTCVD processes

Rapid thermal process can be divided in three different classes of application: resident reaction, surface interaction, deposition (RTCVD)

Application guidelines

Process category

Available systems

Implant annealing
Ohmic contact annealing
Diffusion of dopants
Densification and crystallization

AS-Micro
AS-One
AS-Premium
AS-Master

Implant annealing of silicon carbide

Zenith-100

Oxidation
Nitridation
Selenization

AS-Micro
AS-One
AS-Premium
AS-Master

Silicon carbonization

AS-Master HT version

RTCVD of graphene

AS-One, AS-Master, Zenith-100

Generation of graphene by sublimation

Zenith-100

RTCVD of graphene
RTCVD of hBN (hexagonal boron nitride)

AS-One
AS-Master

RTCVD of poly silicon, epitaxial silicon, SiO2, SiNx

AS-Master RTCVD version