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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA) and Sputtering and plasma equiment from FHR (Germany)

2-inch SprayCVD furnace for laboratories.
Deposition and annealing in the same chamber.

Applications
  • Spray CVD and RTA in the same furnace
  • Implantation annealing
  • Compound semiconductor annealing
  • Crystallization and Densification
  • Etc...
Specifications
  • Two-inch rapid thermal processor for Spray CVD and annealing processes.
  • Dedicated to research applications.
  • Sample size : few square millimeters up to 2-inch diameter.
  • Quartz tube with stainless steel flanges process chamber.
  • Tubular infrared halogen lamps furnace.
  • Very fast ramp rates.
  • Horizontal motion door with quartz tray for easy loading and unloading of the wafers and thermocouple installation.
Performance & characteristics
  • Temperature range: RT to 1200°C (± 1°C)
  • Fast ramp rate up to 250°C/s
  • Precursor mixing capability with Atokit Vaporizers
  • Vacuum range: Atm to 10-6 Torr
  • Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.
  • Optional pyrometer control.
  • The system is provided with full PC control with Windows compatible software.