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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA) and Sputtering and plasma equiment from FHR (Germany)

Versatile 4-inch MOCVD reactor for R&D of new materials. 150 and 200 mm versions available

Applications
  • Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
  • High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)- Ferroelectric: SBT, SBTN, PLZT, PZT
  • Superconductor: YBCO, Bi-2223, Bi-2212, Tl-- 1223, ...
  • Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead - Titanate
  • Colossal Magneto Resistance
  • Thermal coatings
  • Buffer layers
  • Mechanical coatings
  • Optics
  • Etc...
Specifications
  • The Annealsys MC100 is a cold wall MOCVD reactor especially developed to meet the requirements of research and development units.
  • The MC100 allows doing heteroepitaxy of oxides on single crystals wafers (such as YBCO/LAO, STO/MgO, MxOy/LAO,…) by MOCVD using a wide range of solid and liquid organometallic volatile precursors.
  • The MC100 system can be provided with various vaporization systems and vacuum equipment depending on the application.
Performance & characteristics
  • Temperature range: RT to 800°C
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-3 Torr