Browse our products
All products
Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA) and Sputtering and plasma equiment from FHR (Germany)

Low cost 2-inch MOCVD reactor for R&D laboratory.
Deposition and annealing in the same chamber.

Applications
  • Metal and alloys, oxides, transition metal nitrides
  • Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
  • High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
  • Ferroelectric: SBT, SBTN, PLZT, PZT,…- Superconductor: YBCO, Bi-2223, Bi-2212, Tl-1223, …
  • Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate- Colossal Magneto Resistance
  • Thermal coatings
  • Buffer layers
  • Mechanical coatings
  • Optics
  • Etc...
Specifications
  • The Annealsys MC050 is a 2-inch MOCVD and Spray CVD reactor especially developed to meet the requirements of research and development units.
  • The MC050 allows doing heteroepitaxy of oxides on single crystals wafers by MOCVD using a wide range of solid and liquid organometallic precursors. Spray CVD version is also available.
  • The MC050 system can be provided with direct injection vaporizer allowing the widest range of utilization of precursors for development of new materials. The infrared lamp heating system provides in-situ annealing process capability in the deposition chamber.
Performance & characteristics
  • Temperature range: RT to 1200°C
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-3 Torr