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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA) and Sputtering and plasma equiment from FHR (Germany)

Rapid Thermal Processing cold wall chamber furnaces
4-inch (100 mm) and 6-inch (150 mm) versions

Applications
Specifications
  • 4-inch and 6-inch wafer capability
  • Floor standing system for reduced footprint
  • High reliability and low cost of ownership
  • Stainless steel cold wall chamber technology:
  • High process reproducibility
  • Ultra clean and contamination-free environment.
  • High cooling rates and low memory effect
  • A high vacuum version (10-6 mbar) is available
  • Pyrometer and thermocouple control
  • Fast digital PID temperature controller
  • Edge pyrometer viewport insures enhanced temperature control of the susceptor for compound semiconductors and small samples.
Performance & characteristics
  • Temperature range: RT to 1500°C
  • Ramp rate up to 200°C/s
  • Cooling rate up to 100°C/s with special equipment
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atmosphere to 10-6 Torr