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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA) and Sputtering and plasma equiment from FHR (Germany)

3-inch RTP system for laboratories.
Dual chamber version for cross contamination issues

Applications
  • Rapid Thermal Annealing (RTA)
  • Implantation annealing
  • Compound semiconductor annealing
  • Crystallization and Densification
  • Selezination and Sulfurization
  • Etc...
Specifications
  • Three-inch rapid thermal processor
  • Compact table top configuration
  • Dedicated to research applications
  • Sample size: few square millimeters up to 3-inch diameter
  • Optional 3-inch susceptor for 2-inch sample
  • Quartz tube with stainless steel flanges process chamber
  • Tubular infrared halogen lamps furnace
  • Very fast ramp rates
  • Horizontal motion door with quartz tray for easy loading and unloading of the wafers and thermocouple installation.
Performance & characteristics
  • Temperature range: RT to 1250°C
  • Ramp rate up to 250°C/s on 2-inch diameter silicon substrate, 200°C/s on 3-inch
  • Gas mixing capability with mass flow controllers
  • Vacuum range: Atm to 10-2 Torr (10-6 Torr with optional turbo pump)
  • Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.
  • Optional pyrometer control.
  • The system is provided with full PC control with Windows compatible software.