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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Annealsys has developed SprayCVD and MOCVD systems for substrates from 2-inch to 200 mm to fit requirements of R&D laboratories and small scale production. Utilization of state of the art Direct Liquid Injection (DLI) systems allows development of new materials with new chemical precursors.
The SprayCVD-050 and MC-050 furnaces can perform deposition and Rapid Thermal Annealing in the same process.
Low cost 2-inch MOCVD system for R&D laboratory. Deposition and annealing in the same chamber.
Description
Low cost 2-inch MOCVD system for R&D laboratory. Deposition and annealing in the same chamber.
Low cost 2-inch MOCVD system for R&D laboratory. Deposition and annealing in the same chamber.
Versatile 4-inch MOCVD system for R&D.              
Description
Versatile 4-inch MOCVD system for R&D.              
Versatile 4-inch MOCVD system for R&D.              
The Annealsys MC200 is a 200 mm MOCVD.          Capacitance plasma option is available.
Description
The Annealsys MC200 is a 200 mm MOCVD.          Capacitance plasma option is available.
The Annealsys MC200 is a 200 mm MOCVD.          Capacitance plasma option is available.
2-inch SprayCVD furnace for laboratories. Deposition and annealing in the same chamber.
Description
2-inch SprayCVD furnace for laboratories. Deposition and annealing in the same chamber.
2-inch SprayCVD furnace for laboratories. Deposition and annealing in the same chamber.