Description
4-inch LPCVD furnace for small production. Single or dual tube furnaces are available.
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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
Low-Pressure Chemical Vapor Deposition (LPCVD). Poly-Si, SiO2 ,Si3N4, etc...
Systems with two horizontal tubes are also available.
Systems with two horizontal tubes are also available.
