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Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition.
Annealsys offer additional process solutions with ALD machines from Cambridge NanoTech (USA), laboratory sputtering systems from Intercovamex (Mexico) and sputtering and plasma equiment from FHR (Germany)
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ANNEALSYS Products

Annealsys designs and manufactures systems for:

• Rapid Thermal Processing (RTP)
• Rapid Thermal Chemical Vapor Deposition (RTCVD)
• Low Pressure Chemical Vapor Deposition (LPCVD)
• Metal Organic Chemical Vapor Deposition (MOCVD)
• Spray CVD (Spray pyrolysis)

The machines can be used for research and development, quality control, niche production applications in the fields of silicon and compound
semiconductors, MEMS, solar cells, LEDs, glass ...

Annealsys offers service in Rapid Thermal Annealing process from small pieces of wafers and up to 8-inch diameter.
3-inch RTP system for laboratories. Dual chamber version for cross contamination issues
Description
3-inch RTP system for laboratories. Dual chamber version for cross contamination issues
3-inch RTP system for laboratories. Dual chamber version for cross contamination issues
Rapid Thermal Processing cold wall chamber furnaces 4-inch (100 mm) and 6-inch (150 mm) versions
Description
Rapid Thermal Processing cold wall chamber furnaces 4-inch (100 mm) and 6-inch (150 mm) versions
Rapid Thermal Processing cold wall chamber furnaces 4-inch (100 mm) and 6-inch (150 mm) versions
200mm Versatile RTP system RTCVD capability (option) From RT to 1500°C down to 10-6 Torr.
Description
200mm Versatile RTP system RTCVD capability (option) From RT to 1500°C down to 10-6 Torr.
200mm Versatile RTP system RTCVD capability (option) From RT to 1500°C down to 10-6 Torr.
MOCVD & Spray CVD (Metalorganic Chemical Vapor Deposition and Spray Pyrolysis)
Low cost 2-inch MOCVD system for R&D laboratory. Deposition and annealing in the same chamber.
Description
Low cost 2-inch MOCVD system for R&D laboratory. Deposition and annealing in the same chamber.
Low cost 2-inch MOCVD system for R&D laboratory. Deposition and annealing in the same chamber.
Versatile 4-inch MOCVD system for R&D.              
Description
Versatile 4-inch MOCVD system for R&D.              
Versatile 4-inch MOCVD system for R&D.              
The Annealsys MC200 is a 200 mm MOCVD.          Capacitance plasma option is available.
Description
The Annealsys MC200 is a 200 mm MOCVD.          Capacitance plasma option is available.
The Annealsys MC200 is a 200 mm MOCVD.          Capacitance plasma option is available.
2-inch SprayCVD furnace for laboratories. Deposition and annealing in the same chamber.
Description
2-inch SprayCVD furnace for laboratories. Deposition and annealing in the same chamber.
2-inch SprayCVD furnace for laboratories. Deposition and annealing in the same chamber.
4-inch LPCVD furnace for small production. Single or dual tube furnaces are available.
Description
4-inch LPCVD furnace for small production. Single or dual tube furnaces are available.
4-inch LPCVD furnace for small production. Single or dual tube furnaces are available.