Annealsys is partner of Crisilal R&D project with CEA LITEN-INES-RDI, Université Louis Pasteur InESS, Imphy Alloys and Photowatt for crystallization of silicon on metal substrates avoiding substrate impurity diffusion by the selection of an efficient barrier layer between the substrate and the silicon.
Annealsys is in charge of the development of the rapid thermal crystallization process using a new high temperature
RTP tools that can process samples up to 1400°C.
Dr
Jean-Manuel Decams is the scientific manager of the program at Annealsys.