Back to news list Dec/2007 - Annealsys introduces MC050 Spray CVD and MOCVD R&D tool with in-situ annealing capability
Annealsys introduces MC050 2-inch MOCVD and Spray CVD reactor especially developed to meet the requirements of research and development units.The MC050 allows doing heteroepitaxy of oxides on single crystals wafers by MOCVD using a wide range of solid and liquid organometallic precursors. Spray CVD version is also available.
The MC050 system can be provided with Direct Liquid Injection vaporizer allowing the widest range of utilization of precursors for development of new materials.
The infrared lamp heating system provides in-situ annealing process capability in the deposition chamber.
